For ultra-clean surfaces
UV/Ozone Cleaning Systems
The UV/Ozone cleaning process provides a simple, inexpensive and fast method of obtaining ultra-clean surfaces free of organic contaminants. This process is ideal when thin film deposition with excellent adhesion to the surface is required. Ultra-clean surfaces can easily be achieved by UV/Ozone processing in one to several minutes after the surface has been cleaned by conventional techniques.
UV/Ozone
Key features
Ultra clean surfaces
Room temperature
Less than 10 minutes
Easy processing
Modest initial price
Modest initial price
minimal Operation cost
minimal Operation cost
Long-term reliability
Long-term reliability
International shipping
International shipping
Frequently Asked Questions
What does UV / Ozone cleaning remove?
| Solder flux | Residual photoresist |
| Condensed adhesive volatiles | Carbon traces |
| Human skin oils | Most organic contaminants |
How clean is “ultra” clean?
Contact angle measurements of 4-5 degrees. Miniscule peaks when measured with AES and ESCA. With steam test there are uniform rainbow-like fringes during condensation and evaporation. Often, cleaning of critical surfaces prior to other processing steps is considered finished after the usual scrubbing and ultrasoneration steps. UV/Ozone cleaning adds a valuable new dimension to cleaning that can prove itself in dollars and cents in improved performance and reliability in applications where UV/Ozone can be used after the standard cleaning operation.
How does UV / Ozone cleaning work?
The heart of UVOCS cleaning equipment is a low-pressure quartz mercury vapor lamp, which generates UV emissions in the 254 and 185 nanometer range. Ozone and atomic oxygen are generated. Organic contaminant molecules are excited or dissociated by the absorption of the 254 nm wavelength UV. The excited organic contaminants react with the atomic oxygen to form volatile products such as CO2, H2O, etc. The whole process takes place at essentially room temperature* in one to several minutes.
*The temperature rise of parts is dependent on the length of processing time.
What are some applications for UV / Ozone cleaning?
- Prior to thin film deposition on many surfaces
- CD/DVD masters
- Hybrid Substrates prior to wire bonding – removal of condensed epoxy volatiles
- Improved adhesion to plastic surfaces
- GaAs and InP wafers
- Optical lenses
- Creating Thin Oxide on Silicon wafers
- Silicon Wafers
- OLEDs
- Numerous other uses
